JPH0241584B2 - - Google Patents

Info

Publication number
JPH0241584B2
JPH0241584B2 JP12748785A JP12748785A JPH0241584B2 JP H0241584 B2 JPH0241584 B2 JP H0241584B2 JP 12748785 A JP12748785 A JP 12748785A JP 12748785 A JP12748785 A JP 12748785A JP H0241584 B2 JPH0241584 B2 JP H0241584B2
Authority
JP
Japan
Prior art keywords
target
discharge
anode
electrode
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12748785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61284573A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12748785A priority Critical patent/JPS61284573A/ja
Publication of JPS61284573A publication Critical patent/JPS61284573A/ja
Publication of JPH0241584B2 publication Critical patent/JPH0241584B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP12748785A 1985-06-12 1985-06-12 放電電極 Granted JPS61284573A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12748785A JPS61284573A (ja) 1985-06-12 1985-06-12 放電電極

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12748785A JPS61284573A (ja) 1985-06-12 1985-06-12 放電電極

Publications (2)

Publication Number Publication Date
JPS61284573A JPS61284573A (ja) 1986-12-15
JPH0241584B2 true JPH0241584B2 (en]) 1990-09-18

Family

ID=14961159

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12748785A Granted JPS61284573A (ja) 1985-06-12 1985-06-12 放電電極

Country Status (1)

Country Link
JP (1) JPS61284573A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2595009B2 (ja) * 1988-02-08 1997-03-26 日本電信電話株式会社 プラズマ生成装置およびプラズマを利用した薄膜形成装置
US6761804B2 (en) 2002-02-11 2004-07-13 Applied Materials, Inc. Inverted magnetron
US20070051388A1 (en) 2005-09-06 2007-03-08 Applied Materials, Inc. Apparatus and methods for using high frequency chokes in a substrate deposition apparatus
JP5438825B2 (ja) * 2011-04-18 2014-03-12 Ｊｘ日鉱日石金属株式会社 スパッタリングターゲット

Also Published As

Publication number Publication date
JPS61284573A (ja) 1986-12-15

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